Montrose, PA, United States of America

Dennis A Canfield


Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 226(Granted Patents)


Company Filing History:


Years Active: 1992-1994

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3 patents (USPTO):

Title: Innovations by Dennis A. Canfield: Pioneering Electroless Plating Techniques

Introduction

Dennis A. Canfield, an inventive mind based in Montrose, Pennsylvania, has made significant contributions to the field of plating technology. With a notable portfolio consisting of three patents, his work has focused on enhancing the processes and applications of electroless plating, particularly within the electronics sector. Currently affiliated with the renowned International Business Machines Corporation (IBM), Canfield's innovations continue to push the boundaries of circuit manufacturing.

Latest Patents

Among Dennis A. Canfield's latest patents is the innovative method for the conditioning of a substrate for electroless plating. This procedure involves the treatment of a dielectric substrate by contacting it with a catalytic metal salt, followed by a reducing agent and an electroless metal plating bath, which is then treated with a second catalytic metal salt. This technique not only optimizes the substrate preparation but also enhances the overall plating quality.

Another breakthrough patent addresses encapsulated circuitized power core alignment and lamination. This invention outlines a structure and method for producing high-density circuit boards. By utilizing photosensitive or other dielectric materials over a circuitized power core, vias and lands are efficiently opened, filled with joining metal, and aligned with the next level, thereby eliminating significant registration issues and streamlining the manufacturing process.

Career Highlights

Throughout his career, Dennis A. Canfield has demonstrated a profound expertise in technology and innovation, particularly concerning electroless plating methods. His work at IBM has placed him at the forefront of research and development in electronic manufacturing, contributing to the advancement of high-density circuit design.

Collaborations

In his endeavors, Canfield has collaborated with esteemed colleagues, including Perminder S. Bindra and Voya Rista Markovich. These partnerships have enabled the exchange of ideas and fostered a collaborative environment within IBM, further enhancing the potential for innovation in the field.

Conclusion

Dennis A. Canfield's contributions to the field of plating technology through his patents exemplify the spirit of innovation that drives progress in electronic manufacturing. His work not only enhances electroless plating techniques but also sets the stage for future advancements in high-density circuit boards. As a key player at IBM, Canfield continues to inspire the next generation of inventors in the realm of technology.

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