Noblesville, IN, United States of America

Denise R Dewes

This inventor holds 1 USPTO granted patent. Top assignee: Delphi Technologies, Inc.. Active years: 2011.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Denise R Dewes

Introduction

Denise R Dewes is a notable inventor based in Noblesville, IN (US). She has made significant contributions to the field of technology, particularly with her innovative approach to verifying hermetic seals. Her work is characterized by a unique method that utilizes plasma discharge, showcasing her expertise and creativity in engineering.

Latest Patents

Denise holds a patent for a "Plasma discharge method and structure for verifying a hermetical seal." This invention involves a method and structure that leverage the characteristics of plasma discharge to confirm the integrity of a hermetic seal. The plasma discharge is generated within a hermetically sealed cavity using a pair of spaced electrodes that extend from tips inside the cavity to contacts outside. An electrical bias is applied to these contacts, which is sufficient to create a plasma discharge in a properly sealed cavity but not in an unsealed one. This innovative approach enhances the reliability of hermetic seals in various applications.

Career Highlights

Denise is currently employed at Delphi Technologies, Inc., where she continues to develop and refine her inventions. Her work at Delphi has allowed her to collaborate with other talented professionals in the field, further advancing her contributions to technology.

Collaborations

Some of her notable coworkers include Brian E Dewes and Richard D Harlan. Their collaboration has fostered an environment of innovation and creativity, leading to advancements in their respective fields.

Conclusion

Denise R Dewes exemplifies the spirit of innovation through her groundbreaking work in verifying hermetic seals. Her contributions not only enhance technological reliability but also inspire future generations of inventors.

Profile summary based on public USPTO records.
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