Company Filing History:
Years Active: 1995-2001
Title: The Innovative Contributions of Denise M. Puisto
Introduction
Denise M. Puisto is a prominent inventor based in Milton, Vermont, known for her significant contributions to the field of semiconductor technology. With a total of three patents to her name, she has made remarkable advancements that enhance the efficiency and precision of particle beam lithography systems.
Latest Patents
One of her latest patents is titled "Correction of pattern-dependent errors in a particle beam lithography system." This invention involves an e-beam system that corrects the beam for pattern-dependent errors by executing the bulk of the post-processing program only once. It generates two sets of output data through the encode routine. The first output file produces beam control data without pattern-dependent corrections, while the second output file merges this data with metrology marks. A test wafer is patterned using the second output file, which is then measured to create a set of pattern correction data. Production wafers are subsequently written using the beam control data that is corrected on the fly by the pattern correction data.
Another notable patent is the "Liquid immersion heating process for substrate temperature uniformity." This process involves baking a temperature-sensitive film onto a semiconductor substrate by immersing it in a heated liquid. A barrier coating may be applied to the substrate before immersion and removed afterward. The substrate is then cooled by immersing it in a cooling liquid or rinsing it with a liquid at a significantly lower temperature. This method achieves temperature uniformity within ±0.2°C across varying thickness regions in the silicon wafer and membrane, resulting in improved line size control after exposure and development down to 0.25 μm.
Career Highlights
Denise M. Puisto is currently employed at International Business Machines Corporation (IBM), where she continues to innovate and contribute to the field of technology. Her work has been instrumental in advancing semiconductor manufacturing processes.
Collaborations
Denise has collaborated with notable colleagues, including Gregory J. Dick and Abigail S. Ganong, who have also contributed to the field of semiconductor technology.
Conclusion
Denise M. Puisto's innovative patents and contributions to semiconductor technology highlight her role as a leading inventor in her field. Her work continues to influence advancements in particle beam lithography and temperature uniformity processes.