This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Fachhochschule Muenster. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: The Innovative Contributions of Denis Knust
Introduction
Denis Knust is a notable inventor based in Schwerin, Germany. He has made significant contributions to the field of materials science, particularly in developing protective layers for various applications. His innovative approach combines advanced materials with practical methods to enhance the durability and resilience of workpieces.
Latest Patents
Denis Knust holds a patent for a workpiece comprising a laminate designed to protect against impact stress. The patent outlines a method for applying a protective layer that involves mixing a sealing alloy in powder form with a binder and water to create a pasty compound. This compound is then applied to the surface that requires protection, dried, and heated to a temperature of at least 800°C. This innovative method showcases his commitment to enhancing material performance under stress.
Career Highlights
Throughout his career, Denis has worked with esteemed institutions such as Fachhochschule Münster. His experience in academia has allowed him to contribute to research and development in materials science, furthering the understanding of protective coatings and their applications.
Collaborations
Denis has collaborated with notable colleagues, including Juergen Peterseim and Gerald Beermann. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.
Conclusion
Denis Knust's contributions to the field of protective materials are noteworthy, with his patented methods demonstrating a blend of innovation and practicality. His work continues to influence the development of resilient materials that can withstand impact stress, showcasing the importance of research and collaboration in advancing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile