Suresnes, France

Denis Jahan

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Denis Jahan: Innovator in Chemical Vapor Deposition Technologies

Introduction

Denis Jahan is a notable inventor based in Suresnes, France. He has made significant contributions to the field of chemical vapor deposition (CVD) and physical vapor deposition (PVD) technologies. His innovative work focuses on the application of boron compounds in these processes, particularly for the fabrication of photovoltaic solar cells.

Latest Patents

Denis Jahan holds a patent for a process for depositing boron compounds by CVD or PVD. This invention relates to a method for depositing films on a substrate using at least one boron compound. The process is particularly beneficial for creating photovoltaic solar cells. Additionally, it addresses the use of boron compounds to enhance the optical and electrical properties of materials during the deposition process.

Career Highlights

Throughout his career, Denis Jahan has worked with prominent companies, including L'Air Liquide Société Anonyme Pour L'Étude Et L'Exploitation Des Procédés Georges Claude. His experience in these organizations has allowed him to refine his expertise in vapor deposition technologies and contribute to advancements in the field.

Collaborations

Denis has collaborated with notable professionals such as Audrey Pinchart and Pierre Briend. These partnerships have further enriched his work and expanded the impact of his innovations.

Conclusion

Denis Jahan's contributions to the field of chemical vapor deposition and his innovative use of boron compounds have positioned him as a key figure in the development of photovoltaic technologies. His work continues to influence advancements in solar energy applications.

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