Company Filing History:
Years Active: 1988-1993
Title: Innovations of Denis J Poley
Introduction
Denis J Poley is an accomplished inventor based in Richmond, Vermont, known for his contributions to the field of photolithography and epoxy removal processes. With a total of 2 patents, he has made significant advancements that enhance the efficiency and effectiveness of integrated circuit manufacturing.
Latest Patents
One of his latest patents is the "Bilayer metallization cap for photolithography." This innovative process involves patterning a conductive layer on a substrate while avoiding webbing and allowing for high-density patterning. The method incorporates two layers between the resist and the metal, with the first layer being an antireflective coating such as titanium nitride. The second layer serves as a barrier, which may consist of sputtered silicon or SiO.sub.2, preventing interaction between the titanium nitride and acid groups generated during resist exposure.
Another notable patent is the "Process for removal of cured epoxy." This invention utilizes cleaning compositions that include pyridine or substituted pyridines, often in combination with dimethylsulfoxide (DMSO). The preferred compositions contain 5-25% DMSO, which is effective in treating integrated circuit modules enclosed in a cap or can. The method allows for the complete removal of cured epoxy without damaging the underlying metallurgies or passivation layers, thus facilitating rework.
Career Highlights
Denis J Poley has had a distinguished career at International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His work has significantly impacted the semiconductor industry, particularly in enhancing manufacturing processes.
Collaborations
Throughout his career, Denis has collaborated with notable colleagues, including John R Abernathey and Timothy Harrison Daubenspeck. These collaborations have fostered a creative environment that has led to groundbreaking advancements in their respective fields.
Conclusion
Denis J Poley exemplifies the spirit of innovation through his patents and contributions to the technology sector. His work continues to influence the development of efficient manufacturing processes in the semiconductor industry.