Jerusalem, Israel

Denis Glozman

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Denis Glozman. Retrieved from https://idiyas.com/inventor/denis-glozman-d1kzqccx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 9.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: The Innovative Journey of Denis Glozman

Introduction

Denis Glozman is a notable inventor based in Jerusalem, Israel. He has made significant contributions to the field of technology, particularly through his work at Samsung Electronics Ltd. His innovative spirit is reflected in his patent, which showcases his expertise and creativity.

Latest Patents

Denis Glozman holds a patent for a composition that comprises at least one light-emitting moiety. This invention highlights his ability to blend scientific principles with practical applications, contributing to advancements in light-emitting technologies. He has 1 patent to his name, demonstrating his commitment to innovation.

Career Highlights

Throughout his career, Denis has been associated with Samsung Electronics Ltd., a leading company in the technology sector. His role at Samsung has allowed him to work on cutting-edge projects and contribute to the development of new technologies that enhance user experiences.

Collaborations

Denis Glozman has collaborated with talented individuals such as Tadashi Kishimoto and Yuki Hirayama. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

Denis Glozman's journey as an inventor exemplifies the impact of creativity and collaboration in the field of technology. His contributions continue to inspire future innovations and advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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