Woodbury, MN, United States of America

Denis Duchesne

This inventor holds 35 USPTO granted patents and 7 published patent applications, plus 1 CIPO patent and 17 EPO patents, primarily in Fluoropolymer Chemistry. Top assignees: 3M Innovative Properties Company, Dyneon Gmbh. Active years: 1991-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Denis Duchesne. Retrieved from https://idiyas.com/inventor/denis-duchesne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 35 

% Patents Active = 60.0

 

 

Average Co-Inventor Count = 6.3

ph-index = 7

Forward Citations = 179(Granted Patents)


Location History:

  • Saint Paul, MN (US) (1991)
  • Woodbury, MN (US) (2001 - 2024)

Company Filing History:


Years Active: 1991-2025

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Areas of Expertise:
Fluoroolefins
Fluorinated Copolymers
Thermal Decomposition
Tetrafluoroethylene
Fluoropolymer Processing
Conductive Compositions
Sulfonyl Groups
Microemulsions
High Purity Fluoropolymers
Extrudable Thermoplastics
Block Copolymers
Oligomers
35 patents (USPTO):Explore Patents

Title: Inventor Denis Duchesne - Pioneering Innovations in Woodbury, MN

Introduction: Denis Duchesne is a visionary inventor based in Woodbury, MN, known for his groundbreaking contributions to various industries.

Latest Patents: Denis Duchesne holds several patents in the fields of renewable energy, sustainable materials, and advanced manufacturing processes.

Career Highlights: With a career spanning over two decades, Denis Duchesne has been instrumental in developing cutting-edge technologies that have revolutionized the way we approach environmental challenges and industrial processes.

Collaborations: Throughout his career, Denis Duchesne has collaborated with leading research institutions, universities, and innovative companies to bring his ideas to life and make a lasting impact on society.

Conclusion: Denis Duchesne's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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