Company Filing History:
Years Active: 2022-2025
Title: Innovations by Denis Babeshko
Introduction
Denis Babeshko is an accomplished inventor based in New York, NY (US). He has made significant contributions to the field of defect detection systems, holding two patents that showcase his innovative approach to technology.
Latest Patents
Denis Babeshko's latest patents focus on a defect detection system. This computing system generates a training data set for training a prediction model to detect defects present in a target surface of a target specimen. The system identifies a set of images for training the prediction model, which includes a first subset of images. A deep learning network generates a second subset of images for subsequent labeling based on the first subset. Additionally, the deep learning network creates a third subset of images for labeling based on both the first subset and the labeled second subset. The computing system continues this process until a threshold number of labeled images is generated.
Career Highlights
Denis Babeshko works at Nanotronics Imaging, Inc., where he applies his expertise in developing advanced imaging technologies. His work has been instrumental in enhancing the capabilities of defect detection systems, making them more efficient and reliable.
Collaborations
Denis collaborates with talented individuals such as Tonislav Ivanov and Vadim Pinskiy, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Denis Babeshko's contributions to defect detection technology highlight his role as a leading inventor in the field. His innovative patents and collaborative efforts continue to push the boundaries of what is possible in imaging technology.