Rostock, Germany

Dengxu Wang

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Henkel Ag & Company, Kgaa. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dengxu Wang. Retrieved from https://idiyas.com/inventor/dengxu-wang-wdplcxfa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Dengxu Wang

Introduction

Dengxu Wang is a notable inventor based in Rostock, Germany. He has made significant contributions to the field of silane compounds, which are essential in various industrial applications. His work focuses on developing innovative solutions that enhance the performance of materials.

Latest Patents

Dengxu Wang holds a patent for "Silanes and curable compositions comprising said silanes." This invention relates to silane compounds characterized by the general formula (I): SiR(R)(I). The patent outlines a method for preparing these silane compounds and their use as crosslinkers or adhesion promoters. Additionally, it describes a curable composition that includes a reaction product of the silane compound, polyorganosiloxane, and a catalyst.

Career Highlights

Dengxu Wang is currently employed at Henkel AG & Company, KGaA, where he continues to innovate and develop new materials. His expertise in silane compounds has positioned him as a valuable asset in the field of material science.

Collaborations

Some of his notable coworkers include Therese Hemery and Udo Kragl, who collaborate with him on various projects within the company.

Conclusion

Dengxu Wang's contributions to the field of silane compounds demonstrate his commitment to innovation and excellence. His patent and ongoing work at Henkel AG & Company, KGaA highlight his role as a leading inventor in material science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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