Delphine Neel

Title: Delphine Neel: Innovator in Silicon Integration Technologies

Introduction

Delphine Neel is a prominent inventor based in Venissieux, France. She has made significant contributions to the field of silicon integration technologies, holding a total of 3 patents. Her work focuses on innovative methods that enhance the integration of III-V materials with silicon substrates.

Latest Patents

Delphine Neel's latest patents include a method for on-silicon integration of a component III-V and an associated optical component. The first patent describes a method that involves providing a silicon-based optical layer with a waveguide, transferring a III-V-based material onto this layer, and forming the III-V component to enable effective coupling. The second patent outlines a method for the formation of nanowires at the surface of a substrate, utilizing a solid immersion lens to deposit a metal nanoparticle catalyst for nanowire growth.

Career Highlights

Throughout her career, Delphine Neel has worked with notable organizations such as the Commissariat à l'Énergie Atomique et aux Énergies Alternatives and Thales. Her experience in these institutions has allowed her to develop and refine her innovative techniques in silicon integration.

Collaborations

Delphine has collaborated with esteemed colleagues, including Stéphane Getin and Bérangère Hyot. These partnerships have contributed to her success and the advancement of her research.

Conclusion

Delphine Neel is a trailblazer in the field of silicon integration technologies, with a focus on III-V materials. Her innovative patents and collaborations highlight her significant impact on the industry.