Columbus, OH, United States of America

Deepak Sridhar

USPTO Granted Patents = 3 


 

Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2016-2019

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3 patents (USPTO):Explore Patents

Title: Deepak Sridhar: Innovator in Oxygen Carrying Materials

Introduction

Deepak Sridhar is a notable inventor based in Columbus, OH (US). He has made significant contributions to the field of materials science, particularly in the development of oxygen carrying materials. With a total of 3 patents to his name, his work has the potential to impact various applications in energy and environmental technologies.

Latest Patents

One of Deepak Sridhar's latest patents focuses on oxygen carrying materials. In accordance with one embodiment of the present disclosure, an oxygen carrying material may include a primary active mass, a primary support material, and a secondary support material. The oxygen carrying material may consist of about 20% to about 70% by weight of the primary active mass, which includes a composition having a metal or metal oxide selected from the group consisting of Fe, Co, Ni, Cu, Mo, Mn, Sn, Ru, Rh, and combinations thereof. Additionally, the material may include about 5% to about 70% by weight of a primary support material and about 1% to about 35% by mass of a secondary support material.

Career Highlights

Deepak has worked with reputable organizations such as the Ohio State Innovation Foundation and The Ohio State University. His experience in these institutions has allowed him to further his research and development in innovative materials.

Collaborations

Throughout his career, Deepak has collaborated with esteemed colleagues, including Liang-Shih Fan and Fanxing Li. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Deepak Sridhar is a prominent inventor whose work in oxygen carrying materials showcases his innovative spirit and dedication to advancing technology. His contributions are expected to have a lasting impact on the field.

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