This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignee: Dupont Teijin Films U.S. Limited Partnership. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Debra S. Strickland: Innovator in Antistatic Polyester Film Technology
Introduction
Debra S. Strickland is a notable inventor based in Richmond, VA (US). She has made significant contributions to the field of materials science, particularly in the development of antistatic polyester films. Her innovative work has led to the creation of a patented technology that addresses the challenges associated with static electricity in polyester materials.
Latest Patents
Debra holds a patent for an antistatic coated polyester film. This invention includes a self-supporting polyester substrate film that features an antistatic layer on at least one surface. The antistatic layer comprises various components, including antistatic polymers, nonpolymeric cationic antistatic agents, and crosslinkers. This technology is designed to enhance the performance of polyester films in various applications by reducing static electricity.
Career Highlights
Throughout her career, Debra has worked with prominent companies in the industry. She has been associated with DuPont Teijin Films U.S. Limited Partnership and E.I. DuPont De Nemours and Company. Her experience in these organizations has allowed her to develop and refine her expertise in polymer technology and materials science.
Collaborations
Debra has collaborated with several professionals in her field, including Julian Neal Robinson and Jackie H. Symonds. These collaborations have contributed to her innovative work and the successful development of her patented technology.
Conclusion
Debra S. Strickland's contributions to the field of antistatic polyester films highlight her role as an influential inventor. Her patented technology not only addresses practical challenges but also showcases her commitment to innovation in materials science.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
