This inventor holds 2 USPTO granted patents. Top assignee: Cabot Corporation. Active years: 1996-1999.
Location History:
- Orangevale, CA (US) (1996)
- El Dorado Hills, CA (US) (1999)
Company Filing History:
Years Active: 1996-1999
Title: Debra L Scherber: Innovator in Chemical Mechanical Polishing Technology
Introduction
Debra L Scherber is a prominent inventor based in Orangevale, CA (US). She has made significant contributions to the field of chemical mechanical polishing, particularly in the context of integrated circuit manufacturing. With a total of 2 patents, her work has been instrumental in enhancing the efficiency and effectiveness of polishing processes.
Latest Patents
Debra's latest patents include innovative formulations for chemical mechanical polishing slurries. The first patent, titled "Chemical mechanical polishing slurry for metal layers and films," describes a polishing slurry designed for chemically mechanically polishing metal layers and films during various stages of multilevel interconnect fabrication. This slurry comprises an aqueous medium, an abrasive, an oxidizing agent, and an organic acid. It has been found to significantly lower the silicon dioxide polishing rate, yielding enhanced selectivity. Additionally, this polishing slurry effectively polishes metal layers at desired rates while minimizing surface imperfections and defects. The second patent, "Chemical mechanical polishing slurry for metal layers," focuses on a slurry that contains high purity fine metal oxide particles uniformly dispersed in a stable aqueous medium, further advancing the technology in this area.
Career Highlights
Debra L Scherber has had a successful career at Cabot Corporation, where she has applied her expertise in chemical mechanical polishing. Her innovative approaches have contributed to the development of advanced materials and processes that are crucial for the semiconductor industry.
Collaborations
Throughout her career, Debra has collaborated with notable colleagues, including Matthew Neville and David J Fluck. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Debra L Scherber's contributions to the field of chemical mechanical polishing have made her a key figure in the advancement of semiconductor manufacturing technologies. Her patents reflect her commitment to innovation and excellence in her field.