Debra L Meunier

Title: Debra L Meunier: Innovator in Lithographic Measurement Technologies

Introduction

Debra L Meunier is a prominent inventor based in Westford, VT (US). She has made significant contributions to the field of lithographic measurement technologies. With a total of 2 patents, her work has advanced the precision and efficiency of measurement processes in this critical area of technology.

Latest Patents

One of her latest patents is titled "Array foreshortening measurement using a critical dimension scanning electron microscope." This patent describes a method and system for measuring lithographic image foreshortening. The method involves providing a critical dimension scanning electron microscope and utilizing it to measure the foreshortening of defined features formed through lithographic processes. For instance, the critical dimension scanning electron microscope can measure the foreshortening of a line or the separation distance between two arrays of lines, which is essential for determining the focus of the lithographic process.

Another notable patent is the "Nested overlay measurement target." This invention includes a mask overlay measurement target with nested boxes on three levels or adjacent boxes sharing a common side, which saves substantial area. The nested overlay measurement target also reduces measurement time since multiple overlay combinations can be measured simultaneously. This innovation provides more level-to-level overlay information than standard box-in-box targets and offers area savings for stepper field placement metrology.

Career Highlights

Debra L Meunier is currently associated with International Business Machines Corporation (IBM), where she continues to innovate and contribute to the field. Her work has been instrumental in enhancing measurement techniques that are vital for the advancement of lithographic technologies.

Collaborations

Throughout her career, Debra has collaborated with notable colleagues, including Robert K Leidy and Reginald R Bowley, Jr. These collaborations have further enriched her work and contributed to the development of innovative solutions in her field.

Conclusion

Debra L Meunier stands out as a key figure in the realm of lithographic measurement technologies. Her patents reflect her commitment to innovation and her ability to address complex challenges in the industry. Her contributions continue to shape the future of measurement techniques in lithography.