Corpus Christi, TX, United States of America

Debasish Kuila

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1995-1998

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4 patents (USPTO):Explore Patents

Title: Innovations of Debasish Kuila

Introduction

Debasish Kuila is an accomplished inventor based in Corpus Christi, TX (US). He has made significant contributions to the field of photoactive compounds, holding a total of 4 patents. His work focuses on developing new materials that have a wide range of applications in opto-electronics.

Latest Patents

Kuila's latest patents include innovative advancements in photoactive coumarin derivatives. One of his patents discloses a new class of 3,4-dihydrocoumarin derivatives that are useful as photoactive compounds in various applications, including photoresists. These compounds exhibit very high photosensitivity in the deep ultraviolet (DUV) region, around 250 nm, making them ideal for DUV photoresist formulations. Another patent outlines novel processes for preparing these coumarin derivatives, emphasizing a multi-step synthetic method that starts from dihydroxyacetophenone. This process also results in compounds with high photosensitivity, further enhancing their utility in opto-electronic applications.

Career Highlights

Debasish Kuila is currently employed at Hoechst Celanese Corporation, where he continues to innovate in the field of photoactive materials. His work has not only advanced the understanding of coumarin derivatives but has also contributed to the development of new technologies in the industry.

Collaborations

Throughout his career, Kuila has collaborated with notable colleagues, including Michael T Sheehan and George Kvakovszky. These collaborations have fostered a productive environment for innovation and research.

Conclusion

Debasish Kuila's contributions to the field of photoactive compounds demonstrate his commitment to advancing technology in opto-electronics. His innovative patents and collaborative efforts continue to influence the industry positively.

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