Kolkata, India

Debarghya Mukherjee

This inventor holds 1 USPTO granted patent. Top assignees: International Business Machines Corporation, University of Michigan. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Debarghya Mukherjee: Innovator in Fair Machine Learning Metrics

Introduction

Debarghya Mukherjee is a notable inventor based in Kolkata, India. He has made significant contributions to the field of machine learning, particularly in developing fair metrics for similarity assessments. His work focuses on ensuring that machine learning models are not only effective but also equitable.

Latest Patents

Debarghya holds a patent titled "Learning Mahalanobis distance metrics from data." This invention provides techniques for learning Mahalanobis distance similarity metrics from data for individually fair machine learning models. The method involves obtaining data with similarity annotations, selecting a model for learning a Mahalanobis covariance matrix Σ, and learning this covariance matrix from the data using the selected model. The Mahalanobis covariance matrix Σ fully defines the fair Mahalanobis distance similarity metric. He has 1 patent to his name.

Career Highlights

Throughout his career, Debarghya has worked with prestigious organizations, including IBM and the University of Michigan. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.

Collaborations

Some of his notable coworkers include Mikhail Yurochkin and Moulinath Banerjee. Their collaborative efforts have further advanced the understanding and application of fair machine learning metrics.

Conclusion

Debarghya Mukherjee's innovative work in learning Mahalanobis distance metrics showcases his commitment to advancing fair machine learning practices. His contributions are paving the way for more equitable technology solutions in the future.

Profile summary based on public USPTO records.
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