Hwaseong, South Korea

Deagil Hwang

This inventor holds 1 USPTO granted patent. Top assignee: Hyundai Motor Company. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Deagil Hwang. Retrieved from https://idiyas.com/inventor/deagil-hwang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Deagil Hwang: Innovator in Automotive Muffler Technology

Introduction

Deagil Hwang is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the automotive industry, particularly in muffler technology. His innovative designs aim to enhance vehicle performance and reduce noise pollution.

Latest Patents

Hwang holds a patent for a muffler designed for vehicles. This muffler features a plurality of baffles that create multiple chambers within the muffler housing. It includes an exhaust gas inflow pipe connected to one of the chambers, an intermediate pipe that runs parallel to the inflow pipe, and several exhaust gas outflow pipes. This design allows exhaust gases to be discharged outside the muffler housing without passing through the baffles, improving efficiency and sound management. He has 1 patent to his name.

Career Highlights

Deagil Hwang is currently employed at Hyundai Motor Company, where he continues to innovate and develop new technologies for vehicles. His work focuses on enhancing the performance and sustainability of automotive systems.

Collaborations

Hwang collaborates with his coworker, Kichul Park, to further advance their projects and share insights within the automotive engineering field.

Conclusion

Deagil Hwang's contributions to muffler technology exemplify his commitment to innovation in the automotive sector. His work not only improves vehicle performance but also addresses environmental concerns related to noise pollution.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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