Company Filing History:
1 out of 816 
1 out of 2,874 
Years Active: 1996-2001
Title: De-Dul Liao: Innovator in Integrated Circuit Technology
Introduction
De-Dul Liao is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of integrated circuit technology, holding 2 patents that focus on improving contact barriers in integrated circuits. His work has implications for enhancing the performance and reliability of electronic devices.
Latest Patents
Liao's latest patents include innovative methods for forming aluminum-silicon contacts with a barrier layer in integrated circuits. One of his patents discloses a method that enhances the barrier layer by incorporating titanium oxynitride layers adjacent to the silicide film formed at the exposed silicon. This process involves depositing a low-density titanium nitride film over a titanium metal layer in contact with silicon. Subsequent exposure to air allows oxygen and nitrogen to enter the titanium nitride, which is then subjected to rapid thermal anneal (RTA). This process not only facilitates silicidation at the contact location but also results in the formation of titanium oxynitride at the titanium/titanium nitride interface. Liao's alternative embodiments further explore the formation of silicide prior to titanium oxynitride creation, ensuring a high-quality barrier contact structure.
Career Highlights
Throughout his career, De-Dul Liao has worked with prominent companies in the semiconductor industry, including SGS-Thomson Microelectronics Limited and STMicroelectronics GmbH. His experience in these organizations has allowed him to refine his expertise in integrated circuit technology and contribute to advancements in the field.
Collaborations
Liao has collaborated with various professionals, including his coworker Yih-Shung Lin, to further enhance the development of integrated circuit technologies.
Conclusion
De-Dul Liao's innovative work in integrated circuit technology, particularly in improving contact barriers, showcases his significant contributions to the field. His patents reflect a deep understanding of semiconductor processes and a commitment to advancing electronic device performance.