This inventor holds 1 USPTO granted patent. Top assignee: Leland Stanford Junior University. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Dayne F Swearer: Innovator in Photocatalysis
Introduction
Dayne F Swearer is a notable inventor based in Evanston, IL (US). He has made significant contributions to the field of photocatalysis, particularly in the development of multicomponent alloyed plasmonic photocatalysts. His innovative work focuses on improving chemical reactions involving hydrogen, which has broad applications in various industries.
Latest Patents
Dayne F Swearer holds a patent for "Multicomponent alloyed plasmonic photocatalysis." This patent describes an improved method for photocatalysis in chemical reactions involving hydrogen using two-component plasmon-catalyst nanoparticles. The main idea of his work is to configure the optical illumination of the nanoparticles to suppress the formation of an undesirable hydride phase. This concept is applicable to any chemical reaction involving hydrogen, with specific experimental examples including acetylene hydrogenation to produce ethylene, carbon dioxide reduction, and ammonia synthesis. He has 1 patent to his name.
Career Highlights
Dayne is affiliated with Leland Stanford Junior University, where he conducts research and develops innovative solutions in the field of photocatalysis. His work has garnered attention for its potential to enhance chemical processes and contribute to sustainable practices.
Collaborations
Dayne collaborates with fellow researcher Alan Dai, working together to advance their understanding and application of photocatalytic technologies.
Conclusion
Dayne F Swearer is a pioneering inventor whose work in multicomponent alloyed plasmonic photocatalysis is paving the way for advancements in chemical reactions involving hydrogen. His contributions are significant in the pursuit of innovative solutions for sustainable chemical processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
