Barangaroo, Australia

Dawid Oosthuizen

This inventor holds 1 USPTO granted patent. Top assignee: Nearmap Australia Pty Ltd. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dawid Oosthuizen. Retrieved from https://idiyas.com/inventor/dawid-oosthuizen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Dawid Oosthuizen and Adaptive Aerial Survey Technology

Introduction

Dawid Oosthuizen is an inventor based in Barangaroo, Australia, associated with Nearmap Australia Pty Ltd. His patent work concerns adaptive aerial surveying, a technology that can adjust survey coverage or camera orientation in response to images captured during a flight.

Latest Patents

Oosthuizen is associated with 1 patent: “System and Associated Methodology for Adaptive Aerial Survey.” The invention describes capturing images of a target area with a camera system on an aerial vehicle as it follows a flight map containing multiple flight lines. A control system determines the area covered from the captured images and adjusts the flight map, the camera’s orientation, or both, based on that coverage.

Career Highlights

The available information identifies Oosthuizen’s patent contribution in adaptive aerial survey technology and his association with Nearmap Australia Pty Ltd. The patent describes a method and control system for adapting aerial data collection based on observed coverage.

Collaborations

Oosthuizen’s listed coworker is Robert Alan Mitchell. Both are associated with the patent record for the adaptive aerial survey system.

Conclusion

Dawid Oosthuizen’s recorded invention focuses on making aerial surveys responsive to image-based coverage assessments, linking flight planning and camera orientation in an adaptive surveying process.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…