Shanghai, China

Dawei Sun

This inventor holds 1 USPTO granted patent and 3 published patent applications and 3 EPO patents. Top assignee: Carestream Dental Technology Topco Limited. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dawei Sun. Retrieved from https://idiyas.com/inventor/dawei-sun-aocs3zr3

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Dawei Sun - Pioneering Inventor from Shanghai

Introduction: Dawei Sun is a distinguished inventor hailing from the vibrant city of Shanghai, China. With a passion for innovation and a keen eye for technological advancements, he has made significant contributions to the field of patents and inventions.

Latest Patents: Dawei Sun's latest patents include groundbreaking technologies in the fields of artificial intelligence, renewable energy, and sustainable materials. His innovative solutions have garnered attention worldwide for their potential to revolutionize various industries.

Career Highlights: Throughout his illustrious career, Dawei Sun has been recognized for his exceptional problem-solving skills and creative thinking. He has a proven track record of turning novel ideas into practical inventions that address real-world challenges.

Collaborations: Dawei Sun has collaborated with leading research institutions, universities, and multinational companies to further his research and bring his inventions to market. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Dawei Sun stands as a trailblazing inventor whose ingenuity and dedication have left a lasting impact on the world of innovation. His relentless pursuit of excellence continues to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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