Beijing, China

Dawei Han

This inventor holds 3 USPTO granted patents. Top assignees: Boe Technology Group Co., Ltd., Chengdu Boe Optoelectronics Technology Co., Ltd., Hangzhou Futu E-Commerce Technology Co., Ltd.. Active years: 2021-2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dawei Han. Retrieved from https://idiyas.com/inventor/dawei-han

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 66.7

Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2021-2024

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3 patents (USPTO):Explore Patents

Title: Dawei Han: Innovator in Swimwear and Technology

Introduction

Dawei Han is a notable inventor based in Beijing, China. He has made significant contributions to the fields of swimwear and technology, holding a total of three patents. His innovative designs and solutions have garnered attention in various industries.

Latest Patents

Among his latest patents are a women's swimsuit and a universal drain stopper. These inventions showcase his ability to blend functionality with modern design, addressing everyday needs with practical solutions.

Career Highlights

Dawei Han has worked with prominent companies such as Hangzhou Futu E-commerce Technology Co., Ltd. and BOE Technology Group Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.

Collaborations

Throughout his career, Dawei has collaborated with talented individuals, including Jianlin Feng and Jianjun Lin. These partnerships have fostered a creative environment that encourages the development of groundbreaking ideas.

Conclusion

Dawei Han's contributions to innovation in swimwear and technology highlight his role as a forward-thinking inventor. His patents reflect a commitment to enhancing everyday products, making him a significant figure in his field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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