North Plainfield, NJ, United States of America

David Yuan Lou

This inventor holds 1 USPTO granted patent. Top assignee: Bell Telephone Laboratories. Active years: 1976.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1976

Loading Chart...
1 patent (USPTO):Explore Patents

Title: David Yuan Lou: Innovator in High-Resolution Sputter Etching

Introduction

David Yuan Lou is a notable inventor based in North Plainfield, NJ (US). He has made significant contributions to the field of materials science, particularly in the area of sputter etching technology. His innovative approach has led to advancements that are crucial for various applications in electronics and materials engineering.

Latest Patents

David Yuan Lou holds 1 patent for his invention related to high-resolution sputter etching. This patent addresses the challenges associated with etching thick layers of materials, such as gold, using a sputter-etching mask. The invention utilizes a sputter-etching mask made of an etch-resistant material, like titanium, which is interposed between the resist and the thick layer. The technique of sputter etching in a halocarbon atmosphere is employed for patterning the titanium, making the process more feasible and efficient.

Career Highlights

David Yuan Lou has had a distinguished career at Bell Telephone Laboratories, where he has been involved in cutting-edge research and development. His work has not only contributed to the advancement of technology but has also paved the way for new methodologies in the field of sputter etching.

Collaborations

David Yuan Lou has collaborated with various professionals in his field, including his coworker David B. Fraser. These collaborations have fostered an environment of innovation and have led to the development of new techniques and technologies.

Conclusion

David Yuan Lou's contributions to high-resolution sputter etching exemplify the impact of innovative thinking in technology. His work continues to influence the field and inspire future advancements.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…