David Yeo Hock

Title: The Innovative Contributions of David Yeo Hock in Silicon Oxidation Technology

Introduction

David Yeo Hock is a notable inventor based in Singapore, renowned for his contributions to silicon oxidation technology. With one patent to his name, Yeo Hock’s invention addresses significant challenges in the field of integrated circuit technology. His innovative solutions have had a lasting impact on the industry, particularly in enhancing the performance and reliability of semiconductor devices.

Latest Patents

David Yeo Hock holds a patent titled "Dislocation Free Local Oxidation of Silicon with Suppression of Narrow." This patent introduces a novel design of an oxidation mask aimed at improving control of the “birds beak” phenomenon. The invention specifically tailors and smooths the field oxide isolation profile near the birds beak, which is crucial for narrow field isolation spacings commonly found in sub half-micron integrated circuit technology. The patented mask design incorporates a thin silicon nitride foot along its lower edge, allowing nominal oxide expansion during early oxidation stages, thus facilitating in-situ stress relief and enhanced oxide profile smoothing. Additionally, a cantilevered segment of a second, thicker silicon nitride layer effectively suppresses the upward movement of the flexible foot during later oxidation stages. This design significantly reduces shear stresses associated with dislocation generation by up to fifty-fold, while also improving surface topography and mitigating narrow oxide thinning effects.

Career Highlights

Yeo Hock’s career is closely linked with his role at Chartered Semiconductor Manufacturing Ltd., where he has been instrumental in advancing semiconductor technologies. His expertise in oxide growth processes and stress management has positioned him as a leader in the field, demonstrating not only technical skill but also innovation in solving complex engineering problems.

Collaborations

Throughout his career, David Yeo Hock has collaborated with noteworthy professionals such as Igor V Peidous and Konstantin V Loiko. These collaborations have facilitated knowledge sharing and further innovation in semiconductor technology, allowing for the development of groundbreaking solutions that address industry-wide challenges.

Conclusion

David Yeo Hock’s contributions to the field of semiconductor technology, particularly through his innovative patent on silicon oxidation, showcase the vital intersection of creativity and engineering. As technology continues to evolve, the significance of his work will undoubtedly resonate within both academic and industrial communities, inspiring future innovations and advancements in integrated circuit design.