Acworth, GA, United States of America

David W Stollberg

This inventor holds 4 USPTO granted patents. Top assignees: Amit Verma, Georgia Tech Research Corporation, Other. Active years: 2011-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David W Stollberg. Retrieved from https://idiyas.com/inventor/david-w-stollberg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2011-2018

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4 patents (USPTO):Explore Patents

Title: The Innovations of David W. Stollberg

Introduction

David W. Stollberg is an accomplished inventor based in Acworth, Georgia. He holds a total of four patents, showcasing his expertise in electronic device technology. His innovative contributions have significantly impacted the field of electronics.

Latest Patents

Stollberg's latest patents include an electronic device featuring a microfilm antenna and related methods. This electronic device comprises a first substrate with an electrically conductive feed line, an insulating layer, a second substrate, and an antenna with nanofilm layers. The antenna is ingeniously coupled to the feed line through an aperture, enhancing its functionality and performance.

Career Highlights

Throughout his career, Stollberg has worked with notable organizations, including the Georgia Tech Research Corporation. His work has been instrumental in advancing electronic device technology, and his patents reflect his innovative spirit and technical prowess.

Collaborations

Stollberg has collaborated with talented individuals such as Amit Verma and Fabio F. Urbani. These partnerships have contributed to the development of his groundbreaking inventions.

Conclusion

David W. Stollberg's contributions to the field of electronics through his patents and collaborations highlight his role as a significant innovator. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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