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For the Inventor, By the Inventor

Endwell, NY, United States of America

David W Sissenstein, Jr

USPTO Granted Patents = 10

Average Co-Inventor Count = 3.8

ph-index = 7

Forward Citations = 314(Granted Patents)


Company Filing History:

goldMedal10 out of 164,108 
 
International Business Machines Corporation
 patents

Years Active: 1982-1999

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10 patents (USPTO):
1. 5900351 - Method for stripping photoresist (1999-05-04),
2. 5691117 - Method for stripping photoresist employing a hot hydrogen atmosphere (1997-11-25),
3. 5321884 - Multilayered flexible circuit package (1994-06-21),
4. 5241454 - Mutlilayered flexible circuit package (1993-08-31),
5. 5190595 - Ozone safe stripping solution for thermal grease (1993-03-02),
6. 5145104 - Substrate soldering in a reducing atmosphere (1992-09-08),
7. 5028984 - Epoxy composition and use thereof (1991-07-02),
8. 4919729 - Solder paste for use in a reducing atmosphere (1990-04-24),
9. 4632295 - Reduction atmosphere workpiece joining (1986-12-30),
10. 4358627 - Reducing chloride concentration (1982-11-09),

Title: Innovations of David W Sissenstein, Jr.

Introduction

David W Sissenstein, Jr. is a notable inventor based in Endwell, NY (US). He has made significant contributions to the field of technology, particularly in the area of photoresist stripping methods. With a total of 10 patents to his name, Sissenstein has demonstrated a commitment to innovation and problem-solving in his work.

Latest Patents

Among his latest patents is a method for stripping photoresist using a hot hydrogen atmosphere. This innovative approach allows organic photoresists to be quickly, conveniently, and completely stripped. The substrates are exposed to a hydrogen conveyor furnace, where the gases are burned to carbon dioxide and water, eliminating the need for a stripping agent. Another patent focuses on the same method, emphasizing the efficiency and effectiveness of using a hot hydrogen atmosphere for this process.

Career Highlights

David W Sissenstein, Jr. is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to technology and innovation.

Collaborations

Some of his notable coworkers include Joseph G Ameen and Joseph Funari. Their collaboration has likely contributed to the development of innovative solutions in their respective projects.

Conclusion

David W Sissenstein, Jr. is a prominent inventor whose work in photoresist stripping methods has made a significant impact in the technology sector. His patents reflect a dedication to advancing industry practices and improving efficiency.

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