David W Meyers

Title: The Innovative Contributions of David W. Meyers

Introduction

David W. Meyers is a notable inventor based in Poway, California, recognized for his significant contributions to the field of laser technology. He holds a patent for a unique gas discharge laser system that has applications in integrated circuit lithography. His work exemplifies the intersection of innovation and practical application in modern technology.

Latest Patents

Meyers' patent, titled "Very narrow band, two chamber, high reprate gas discharge laser system," describes an injection seeded modular gas discharge laser system. This system is capable of producing high-quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. The design features two separate discharge chambers, allowing for independent optimization of wavelength and pulse energy parameters. A preferred embodiment of this invention is configured as an ArF excimer laser system designed specifically for use as a light source in integrated circuit lithography.

Career Highlights

David W. Meyers has made significant strides in the field of laser technology during his career at Cymer, Inc. His innovative designs and patents have contributed to advancements in high-speed laser systems, enhancing the capabilities of modern manufacturing processes.

Collaborations

Meyers has collaborated with notable colleagues, including David S. Knowles and Daniel J. W. Brown. These partnerships have fostered a collaborative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

David W. Meyers is a distinguished inventor whose work in gas discharge laser systems has made a lasting impact on the field of laser technology. His contributions continue to influence advancements in integrated circuit lithography and beyond.