Lawrenceville, NJ, United States of America

David V Orent

This inventor holds 4 USPTO granted patents. Top assignee: Mcneil-Ppc, Inc.. Active years: 2000-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David V Orent. Retrieved from https://idiyas.com/inventor/david-v-orent

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 154(Granted Patents)


Company Filing History:


Years Active: 2000-2001

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4 patents (USPTO):Explore Patents

Title: The Innovations of David V Orent

Introduction

David V Orent is a notable inventor based in Lawrenceville, NJ (US). He has made significant contributions to the field of absorbent articles, holding a total of 4 patents. His work reflects a commitment to innovation and improvement in product design.

Latest Patents

Among his latest patents is a design for a surface pattern for an absorbent article. This patent showcases his ability to enhance the functionality and aesthetics of everyday products. His innovative approach continues to push the boundaries of design in the absorbent article industry.

Career Highlights

David currently works at McNeil-PPC, Inc., where he applies his expertise in product development. His role at the company allows him to collaborate with other talented professionals and contribute to the advancement of new technologies.

Collaborations

Throughout his career, David has worked alongside notable colleagues such as Kofi A Bissah and Barbara A Ludwig. These collaborations have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

David V Orent's contributions to the field of absorbent articles exemplify the spirit of innovation. His patents and collaborations highlight his dedication to improving product design and functionality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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