Company Filing History:
Years Active: 2013
Title: Innovating Semiconductor Fabrication: The Contributions of David V MacDonnell, II
Introduction: David V MacDonnell, II is a talented inventor based in Huntington, VT (US) who focuses on semiconductor fabrication processes. With a patent to his name and a wealth of experience, he has made valuable contributions to the field.
Latest Patents: David V MacDonnell, II holds a patent for "Methods and systems to meet technology pattern density requirements of semiconductor fabrication processes." This patent involves optimizing pattern density fill patterns for integrated circuits, specifically by adjusting the area of a scribe line and the density of dummy fill shapes to meet technology ground rules.
Career Highlights: David V MacDonnell, II is associated with the renowned company IBM (International Business Machines Corporation). His work within the company showcases his expertise in semiconductor technology and his dedication to pushing the boundaries of innovation.
Collaborations: Within the realm of his work, David V MacDonnell, II collaborates with individuals such as Jeanne P Bickford and Allan O Cruz. These collaborations have led to the development of cutting-edge solutions in semiconductor fabrication processes.
Conclusion: David V MacDonnell, II's contributions to semiconductor fabrication processes, particularly in optimizing pattern density fill patterns for integrated circuits, highlight his innovation and expertise in the field. His patent and collaborations with industry experts underline his commitment to advancing technology in meaningful ways.