David T Hodul

Title: Innovations of David T Hodul

Introduction

David T Hodul is a notable inventor based in Oakland, CA. He has made significant contributions to the field of plasma processing technology, holding a total of four patents. His work focuses on methods that enhance the efficiency and effectiveness of substrate processing in various applications.

Latest Patents

One of his latest patents is titled "Method for Microwave Plasma Substrate Heating." This invention describes a method of microwave heating of a substrate in a plasma processing chamber. In this process, a heatup gas is supplied into the chamber, and the gas is energized with microwave power to heat the exposed surface of the substrate. Additionally, a reactant gas is introduced and energized into a plasma state to process the substrate effectively.

Another significant patent is "Method for Reduction of Plasma Charging Damage During Chemical Vapor." This invention outlines a graded gap fill process in a high-density plasma processing chamber. It involves depositing an insulating layer on a substrate without causing plasma charge-related damage. The process includes the deposition of a protection layer above the first layer, which is done using specific parameters to minimize damage. This is followed by the deposition of a fill layer that ensures electrical isolation between the layers.

Career Highlights

David T Hodul has worked with prominent companies in the industry, including Lam Research Corporation and Varian Associates, Inc. His experience in these organizations has contributed to his expertise in plasma processing technologies and innovations.

Collaborations

Throughout his career, David has collaborated with notable individuals such as James Lam and Gregory A Roche. These collaborations have likely enriched his work and led to advancements in the technologies he has developed.

Conclusion

David T Hodul is a distinguished inventor whose work in plasma processing has led to significant advancements in the field. His innovative patents reflect his commitment to improving substrate processing methods. His contributions continue to influence the industry positively.