David Sturdevant

Title: David Sturdevant and Semiconductor Measurement Patents.

Introduction

David Sturdevant is an inventor associated with Gresham, Oregon, and LSI Corporation. His patent work includes methods for measuring registration and critical dimensions in multilayer semiconductor integrated circuits. He is credited with 2 patents.

Latest Patents

Sturdevant’s listed patent, “Multi-layer registration and dimensional test mark for scatterometrical measurement,” describes a layered test pattern designed to assess registration and critical dimension (CD) in semiconductor circuits. The first layer contains vertical and horizontal patterns, while a second layer above it contains corresponding patterns with nominal phase shifts. These patterns include periodically repeating lines, and the phase shifts may be half the lines’ period.

A scatterometry tool measures both line width and the relative phase shift between the patterns. The measured line width indicates critical dimension, while the difference between the measured and nominal phase shifts reveals registration variation. The supplied patent information lists this title and description twice.

Career Highlights

Sturdevant’s documented patent contribution focuses on semiconductor metrology: using patterned test marks and scatterometry to evaluate dimensions and alignment across multiple layers. The supplied information associates him with LSI Corporation.

Collaborations

The supplied information names Phong Thanh Do and Kirk Rolofson as Sturdevant’s coworkers. It does not specify their roles in the patent or describe particular collaborations.

Conclusion

David Sturdevant’s patent work addresses precise measurement of line dimensions and layer registration in semiconductor manufacturing, with a test-mark approach intended to help identify variations in both.