Loveland, CO, United States of America

David Straw

This inventor holds 1 USPTO granted patent. Top assignee: Hewlett-Packard Development Company, L.p.. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Straw. Retrieved from https://idiyas.com/inventor/david-straw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of David Straw

Introduction

David Straw is an accomplished inventor based in Loveland, Colorado. He has made significant contributions to the field of technology, particularly in the area of storage solutions. With a focus on enhancing user experience, his work has garnered attention in the industry.

Latest Patents

David holds a patent for a method of displaying multiple storage windows. This innovative approach allows for the depiction of storage capacity in a first window, which can be expanded to nest two additional storage windows. This invention showcases his ability to simplify complex storage management for users.

Career Highlights

David Straw is currently employed at Hewlett-Packard Development Company, L.P. His role at this prominent technology firm allows him to work on cutting-edge projects that push the boundaries of innovation. His dedication to improving technology is evident in his patent and ongoing contributions to the field.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Peter M. Maddocks and Matt Zinkevicius. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of innovative solutions.

Conclusion

David Straw's contributions to technology through his patent and work at Hewlett-Packard Development Company, L.P. highlight his innovative spirit and commitment to enhancing user experience. His work continues to inspire others in the field of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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