Yokneam Ilit, Israel

David Starosvetsky

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 17(Granted Patents)


Location History:

  • Yokneam Elit, IL (2004)
  • Yokneam, IL (2009)
  • Yokneam Ilit, IL (2003 - 2011)

Company Filing History:


Years Active: 2003-2025

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5 patents (USPTO):Explore Patents

Title: David Starosvetsky: Innovator in Composite Conductors

Introduction

David Starosvetsky is an accomplished inventor based in Yokneam Ilit, Israel. He holds a total of 5 patents that showcase his expertise in the field of composite conductors and chemical-mechanical planarization.

Latest Patents

One of his latest patents is for carbon-nanotubes copper composite conductors. This innovation features composite conductors that have copper deposits inside the bulk rather than on the outer surface of a non-metallic conductive porous matrix, such as CNT fabric. The composite conductors are characterized by a low specific weight and high ampacity compared to metal conductors of similar size and shape. Another significant patent is for a copper CMP slurry composition. This composition rapidly passivates copper-containing surfaces to yield a uniform layer of insoluble copper oxide, which is useful in the chemical-mechanical planarization of copper-containing surfaces. The composition has a pH of equal to or greater than 9 and possesses an oxidation potential sufficient to oxidize the surface to form non-soluble copper oxides.

Career Highlights

David has worked with notable organizations, including the Technion Research & Development Foundation Limited and Applied Materials, Inc. His contributions to these companies have significantly advanced the field of materials science and engineering.

Collaborations

Throughout his career, David has collaborated with esteemed colleagues such as Joseph Yahalom and Yair Ein-Eli. These partnerships have fostered innovation and development in his areas of expertise.

Conclusion

David Starosvetsky is a prominent figure in the realm of composite conductors and chemical-mechanical planarization. His innovative patents and collaborations reflect his commitment to advancing technology in these fields.

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