Hamilton, Canada

David Sloan

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Arcelormittal. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Sloan. Retrieved from https://idiyas.com/inventor/david-sloan-ap9us453

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: David Sloan - Innovator in Edge Build-Up Measurement

Introduction

David Sloan is an accomplished inventor based in Hamilton, Canada. He has made significant contributions to the field of manufacturing, particularly in the area of metallic coated coils. His innovative approach to edge build-up measurement has garnered attention in the industry.

Latest Patents

David Sloan holds a patent for a method of controlling the coating thickness homogeneity on metallic coated coils. This method involves several steps, including measuring distances between reference points on the coil surface, computing differences, and saving these differences to define a threshold value. The process emits alerts when the differences exceed the threshold, ensuring quality control in manufacturing.

Career Highlights

David Sloan is currently employed at ArcelorMittal, a leading global steel and mining company. His work focuses on enhancing manufacturing processes and improving product quality through innovative measurement techniques. His dedication to advancing technology in the industry is evident in his patent and ongoing projects.

Collaborations

Due to space constraints, the collaborations section will be omitted.

Conclusion

David Sloan's contributions to edge build-up measurement reflect his commitment to innovation in manufacturing. His patent demonstrates the importance of quality control in the production of metallic coated coils.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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