Cambridgeshire, United Kingdom

David Sewell

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Domino Printing Sciences Plc. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Sewell. Retrieved from https://idiyas.com/inventor/david-sewell

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: David Sewell - Innovator in Inkjet Printing Technology

Introduction

David Sewell is a notable inventor based in Cambridgeshire, GB. He has made significant contributions to the field of inkjet printing technology. His innovative approach has led to the development of a unique patent that addresses common challenges in the industry.

Latest Patents

David Sewell holds a patent for an innovative bottle cap design. This invention describes a bottle cap in which a detachable section can be ruptured from the remainder of the cap using a common tool, such as a hex key. A frangible seal, recessed below the upper surface of the cap, connects the detachable section to the remainder of the cap. This design minimizes the risk of spillage when the detachable section is withdrawn. He has 1 patent to his name.

Career Highlights

David Sewell is associated with Domino Printing Sciences Plc, a company known for its advancements in printing technology. His work at this organization has allowed him to focus on innovative solutions that enhance the efficiency and effectiveness of printing processes.

Collaborations

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Conclusion

David Sewell's contributions to inkjet printing technology exemplify his innovative spirit and dedication to solving industry challenges. His patent reflects a thoughtful approach to design and functionality, making a significant impact in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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