Ballston Spa, NY, United States of America

David S Schlitzer

USPTO Granted Patents = 3 


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2009-2015

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3 patents (USPTO):Explore Patents

Title: David S. Schlitzer: Innovator in Chemical Processes

Introduction

David S. Schlitzer is a notable inventor based in Ballston Spa, NY (US). He has made significant contributions to the field of chemical processes, holding a total of 3 patents. His work focuses on improving industrial processes, particularly in the area of chlorosilane and polysiloxane compositions.

Latest Patents

One of his latest patents is titled "Process for reducing the level of chloride in chlorosilane direct process hydrolyzed substrate." This invention relates to a method for providing a low-chloride hydrolyzate by contacting an acid or base hydrolyzed substrate of a chlorosilane direct process residue with nitric acid. The result is a hydrolyzate with a chloride content of less than about 1.8% by weight, which is particularly useful in cement kilns and smelter operations. Another significant patent is for a "Branched polysiloxane composition." This invention involves branched polysiloxane compositions created by copolymerizing a mixture of organosilicon compounds and silylhydride-containing compounds under hydrosilylation conditions.

Career Highlights

David S. Schlitzer is currently employed at Momentive Performance Materials GmbH, where he continues to innovate and develop new chemical processes. His expertise in the field has led to advancements that benefit various industrial applications.

Collaborations

Throughout his career, David has collaborated with notable colleagues, including John P. Banevicius and Susan Adams Nye. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

David S. Schlitzer's contributions to chemical processes through his patents demonstrate his commitment to innovation in the industry. His work continues to have a lasting impact on various applications, showcasing the importance of research and development in advancing technology.

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