Company Filing History:
Years Active: 1989-1996
Title: **Innovations by David S Holbrook: Pioneering Patents in Lithography**
Introduction
David S Holbrook, based in Woburn, MA, is an accomplished inventor with a focus on advancements in lithographic systems. With two patents to his name, Holbrook has made significant contributions to the field of optical alignment, enhancing the precision and efficiency of flat panel display manufacturing.
Latest Patents
David S Holbrook's latest innovations include two notable patents that are instrumental in the lithography process. The first patent, titled "Alignment system for use in lithography utilizing a spherical reflector," describes a system designed to align substrates in the preparation of flat panel displays. This system employs a spherical reflector that focuses a small geometric object onto the substrate's surface, providing exceptional depth of field with minimized aberrations. The innovative optical system allows for precise alignment by correlating the position with the amount of light diffracted from a grid of stepped patterns on the substrate.
The second patent, “Optical alignment system for use in photolithography and having reduced alignment errors,” showcases a direct reticle reference alignment system. This system utilizes a movable stage to hold a transmissive substrate, illuminating it with a light source to project a reticle alignment image. With the aid of a sensor that detects light reflected from the plate mark on the substrate, the system adjusts the stage positioning for optimal alignment. This complex setup not only enhances the precision of the alignment process but significantly improves the efficiency of photolithographic operations.
Career Highlights
David S Holbrook is currently associated with Mrs Technology, Inc., where he continues to innovate within the realm of optical systems. His expertise in lithography and optical alignment has been pivotal in driving advancements in the manufacturing processes of electronic displays.
Collaborations
Throughout his career, Holbrook has collaborated with notable colleagues such as J Casey Donaher and Shepard D Johnson. Their combined expertise in technology and innovation has contributed to the successful development of the state-of-the-art systems and patents that are now recognized in the industry.
Conclusion
David S Holbrook stands out as a visionary inventor who has significantly impacted the field of lithography through his innovative patents. His work not only enhances manufacturing precision but also sets new standards in technology. With a commitment to advancing optical alignment systems, Holbrook's contributions will continue to influence the industry for years to come.