Lexington, MA, United States of America

David Rosenthal

This inventor holds 1 USPTO granted patent. Top assignee: Gca Corporation. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Rosenthal. Retrieved from https://idiyas.com/inventor/david-rosenthal-cefrqpbv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 34(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: David Rosenthal: Innovator in Microlithography

Introduction

David Rosenthal is a notable inventor based in Lexington, MA (US). He has made significant contributions to the field of microlithography, particularly through his innovative patent related to reticle bar codes. His work has implications for the efficiency and accuracy of semiconductor manufacturing processes.

Latest Patents

David Rosenthal holds a patent for a "Reticle bar code and method and apparatus for reading same." This patent utilizes the unique characteristics of microlithographic reticles to create a bar code scheme that offers multiple levels of error checking. The method allows for an extensive repertoire of reticle identifying characters, enhancing the identification process in manufacturing. The reading process involves moving the reticle past a photoelectric sensor, where the width of each bar is measured by counting a clock signal. A synchronization character at the start of the data character string provides a nominal bar width value, ensuring accuracy in the reading process.

Career Highlights

David Rosenthal is associated with GCA Corporation, a company known for its advancements in photolithography equipment. His role at GCA Corporation has allowed him to apply his innovative ideas in practical settings, contributing to the company's reputation in the industry.

Conclusion

David Rosenthal's contributions to microlithography through his patent on reticle bar codes exemplify the importance of innovation in technology. His work not only enhances manufacturing processes but also showcases the potential for further advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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