David R Winn

Title: David R. Winn: Innovator in Electron Multiplication Technology

Introduction

David R. Winn is a notable inventor based in Wilton, CT (US), recognized for his contributions to the field of electron multiplication technology. With a total of 6 patents to his name, Winn has made significant advancements that enhance the sensitivity and resolution of imaging devices.

Latest Patents

One of his latest patents is the Micro-dynode integrated electron multiplier. This innovative device features numerous microchannels that extend parallel to one another through a layered structure. It incorporates insulating spacer layers and dynode layers, which either include a conductive electrode layer or are contiguous with one. The dynode layers are made from materials with high electron emissivity and can be biased to different electrical potentials, creating a potential gradient along the length of each microchannel. This multi-stage electron multiplication results in high gain, and the device is designed as a monolithic, sealed structure with a cathode and an anode, enabling extremely high sensitivity and resolution in multi-pixel imaging devices.

Another significant patent is for microporous microchannel plates and the method of manufacturing them. This microchannel plate consists of an anodized material with a plurality of channels formed during the anodization process. These channels extend between both sides of the plate, and electrodes are placed on each side to generate an electrical field within the channels. The preferred material for this invention is alumina, with activated channels that have conductive and highly secondary emissive walls.

Career Highlights

Throughout his career, David R. Winn has worked with several prominent companies, including Nanosciences Corporation and Advanced Technology Materials, Inc. His work has significantly impacted the development of advanced electron multiplication technologies.

Collaborations

Winn has collaborated with notable individuals in his field, including John Steinbeck and Robert W. Boerstler. Their combined expertise has contributed to the advancement of innovative technologies in electron multiplication.

Conclusion

David R. Winn's contributions to electron multiplication technology through his patents and collaborations have established him as a key figure in the field. His innovative work continues to influence advancements in imaging devices, showcasing the importance of his inventions.