David R Klueh

Title: David R Klueh: Innovator in Film Printing Technology

Introduction

David R Klueh is a notable inventor based in Lexington, KY (US). He has made significant contributions to the field of film printing technology, holding 2 patents that showcase his innovative approach to materials and processes.

Latest Patents

One of his latest patents is for a "Reduced thickness resin substrate in film printing ribbon." This invention features a very thin film ribbon that exhibits excellent printing and lift-off correction characteristics. The substrate material is a blend of polyethylene and isotactic polypropylene, which allows for dense printing on rough papers when thicker ribbons are used. Another significant patent is for an "Aliphatic polyurethane matrix transfer medium and porous magnesium." This matrix transfer medium utilizes an aliphatic polyester polyurethane binder formed directly on an untensilized polyethylene terephthalate film substrate. The inclusion of porous magnesium silicate as a minor filler effectively controls ink flow during printing, resulting in overall good performance in both ribbon feed and printing.

Career Highlights

David R Klueh is currently associated with International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to explore and develop innovative solutions in the printing technology sector.

Collaborations

Throughout his career, David has collaborated with notable coworkers such as Jack W Morris and Kent G Urdahl. These collaborations have likely contributed to the advancement of his projects and patents.

Conclusion

David R Klueh's contributions to film printing technology through his patents reflect his innovative spirit and dedication to improving printing processes. His work continues to influence the industry and showcases the importance of research and development in technology.