David R Fahrbach

Title: Innovations of David R Fahrbach

Introduction

David R Fahrbach is a notable inventor based in Madison, WI (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of X-ray detectors. With a total of two patents to his name, his work has implications for various applications in medical imaging and materials analysis.

Latest Patents

Fahrbach's latest patent focuses on a feedback circuit for output control in a semiconductor X-ray detector. This innovative design utilizes a semiconductor detector, specifically a Silicon Drift Detector, which employs a field effect transistor or other voltage-controlled resistance. The circuit generates an output voltage that is proportional to the input charge created by X-ray photons. To maintain the output voltage within an acceptable range, a feedback circuit is established between the output and input terminals. This circuit depletes the charge on the input terminal when the output voltage deviates from the desired range. A comparator monitors the output voltage and provides a reset signal to the input terminal when necessary, ensuring the system operates effectively.

Career Highlights

David R Fahrbach is currently employed at Thermo Electron Scientific Instruments Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of X-ray detection systems.

Collaborations

Fahrbach has collaborated with notable colleagues, including William E Drummond and James V Howard. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

David R Fahrbach's contributions to semiconductor technology and X-ray detection systems highlight his role as an influential inventor. His innovative patents and collaborations reflect his commitment to advancing scientific knowledge and practical applications in the industry.