This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: General Electric Company. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: David Poerschke: Innovator in Silicon-Based Repair Methods
Introduction
David Poerschke is an accomplished inventor based in Santa Barbara, California. He has made significant contributions to the field of materials science, particularly in the development of innovative repair methods. His work focuses on silicon-based formulations that have practical applications in various industries.
Latest Patents
David Poerschke holds a patent for a silicon-based patch formulation. This formulation comprises about 25 to 66 percent by volume of a solvent, about 4 to 10 percent by volume of a silicon-comprising binding material, and about 30 to 65 percent by volume of a patching material. The patching material includes particles containing one or more non-actinide Group IIIA elements. The molar ratio of these elements to silicon within the patch formulation is approximately 0.95 to 1.25. This innovative approach enhances the effectiveness of repair methods in various applications.
Career Highlights
David Poerschke is currently associated with General Electric Company, where he continues to develop and refine his innovative ideas. His work has garnered attention for its potential to improve repair techniques and materials used in different sectors.
Collaborations
David has collaborated with notable colleagues, including Don Mark Lipkin and Nicholas Edward Antolino. These partnerships have contributed to the advancement of his research and the successful implementation of his patented technologies.
Conclusion
David Poerschke is a notable inventor whose work in silicon-based repair methods showcases his innovative spirit and dedication to advancing materials science. His contributions have the potential to impact various industries positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
