David P Wanamaker

Title: David P. Wanamaker: Innovator in Plasma Processing Technology

Introduction

David P. Wanamaker is a notable inventor based in San Jose, CA, with a focus on advancements in plasma processing technology. He holds a total of 4 patents, showcasing his contributions to the field. His work is primarily associated with Applied Materials, Inc., a leading company in the semiconductor and display industries.

Latest Patents

One of Wanamaker's latest patents is for a toroidal plasma source designed for plasma processing. This innovative toroidal plasma source operates within a substrate processing chamber, forming a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to the surface of the plasma generating structure, which significantly reduces sputtering erosion of the inner walls. Additionally, the plasma current is also parallel to the process surface of a substrate within the chamber. A further embodiment of this invention includes a shaped member positioned between the substrate and the plasma source, which controls the plasma density in a selected manner to enhance plasma processing uniformity.

Career Highlights

Throughout his career, David P. Wanamaker has made significant strides in the field of plasma technology. His innovative approaches have led to advancements that improve the efficiency and effectiveness of plasma processing in various applications. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Wanamaker has collaborated with several talented individuals, including Robert B. Majewski and John P. Parks. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies.

Conclusion

David P. Wanamaker's work in plasma processing technology exemplifies the impact of innovation in the semiconductor industry. His patents and collaborations reflect a commitment to advancing technology and improving processes within the field.