Saint Paul, MN, United States of America

David P Siglin

This inventor holds 1 USPTO granted patent and 6 published patent applications. Top assignee: 3M Innovative Properties Company. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David P Siglin. Retrieved from https://idiyas.com/inventor/david-p-siglin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: David P. Siglin and His Patent in Polishing Technology.

Introduction

David P. Siglin is an inventor associated with Saint Paul, Minnesota, and 3M Innovative Properties Company. His patent work concerns polyurethane materials and their use in polishing applications.

Latest Patents

The provided information lists 1 patent for Siglin: “Polyurethanes, Polishing Articles and Polishing Systems Therefrom and Method of Use Thereof.” The patent describes polyurethanes made from a reactive mixture containing a polyol with a number-average molecular weight of at least 400 Daltons, a diol chain extender with a molecular weight below 400 Daltons, a diisocyanate, and a multifunctional amine. It also covers polishing layers and pads made from these polyurethanes, along with polishing systems and methods that use them.

Career Highlights

Siglin’s listed patent reflects work on material formulations designed for polishing layers and pads. The disclosure connects polyurethane chemistry with polishing articles, systems, and methods of use.

Collaborations

The provided information names Joseph D. Rule and Jaimie E. Stomberg as Siglin’s coworkers. Their association points to a broader team context around the company’s patent activity.

Conclusion

David P. Siglin’s listed invention brings together polyurethane formulation and polishing technology, addressing materials, polishing articles, systems, and methods of use.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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