This inventor holds 1 USPTO granted patent. Top assignee: Advanced Semiconductor Materials America, Inc.. Active years: 1992.
Company Filing History:
Years Active: 1992
Title: David P Lambert: Innovator in Plasma Technology
Introduction
David P Lambert is a notable inventor based in Costa Mesa, CA (US). He has made significant contributions to the field of semiconductor materials, particularly in the area of plasma technology. His innovative work has led to the development of a patent that enhances the efficiency of power transfer in chemical vapor deposition systems.
Latest Patents
David P Lambert holds a patent for a "Transmission line for providing power to an electrode boat in a plasma." This invention involves a transmission line constructed from ceramic and nickel materials, designed to match the characteristic impedance of a boat assembly in a chemical vapor deposition system. The transmission line is strategically placed between a set of feedthroughs through the wall of a reactant tube and a set of contacts on the boat assembly. This design improves the efficiency of power transfer from an RF power source external to the reactant tube, particularly at high frequencies such as 13.56 MHz. The result is enhanced repeatability in the deposition of film on wafers within the boat assembly.
Career Highlights
David P Lambert is associated with Advanced Semiconductor Materials America, Inc., where he applies his expertise in semiconductor technology. His work has been instrumental in advancing the capabilities of chemical vapor deposition systems, which are critical in the manufacturing of semiconductor devices.
Collaborations
David has collaborated with notable colleagues, including Michael R Bonsaver and Rand A Conner. Their combined efforts contribute to the innovative environment at Advanced Semiconductor Materials America, Inc.
Conclusion
David P Lambert's contributions to plasma technology and semiconductor materials have made a significant impact in the industry. His patent reflects his commitment to improving efficiency in chemical vapor deposition systems. His work continues to influence advancements in semiconductor manufacturing.