This inventor holds 1 USPTO granted patent. Top assignee: Physical Sciences, Inc.. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: **David O. Ham: Innovator in Combustion Emission Reduction**
Introduction
David O. Ham is an accomplished inventor based in Lexington, MA, known for his critical advancements in environmental technologies. With a keen focus on reducing harmful emissions, David has contributed significantly to the field of combustion processes.
Latest Patents
David holds a patent titled "Process for removing NO.sub.x emissions from combustion effluents." This innovative method specifically targets the removal of nitrogen oxides (NO.sub.x) from the exhaust products of combustion. It involves the addition of an alkyl amine—particularly monomethyl amine (CH.sub.3 NH.sub.2)—to the exhaust stream at relatively low temperatures ranging from 350°C to 650°C. Notably, this process does not require a catalyst for the reaction to occur, making it a significant advancement in reducing NO.sub.x emissions effectively.
Career Highlights
David is associated with Physical Sciences, Inc., where he continues his research and development efforts. His dedication to innovation and environmental protection through the advancement of combustion technologies has positioned him as a key contributor in his field.
Collaborations
Throughout his career, David has collaborated with notable colleagues, including Gary A. Moniz and Melanie J. Gouveia. These partnerships have played an important role in his research initiatives and the successful development of his patented technologies.
Conclusion
In summary, David O. Ham's innovative contributions toward the reduction of nitrogen oxides in combustion processes reflect his commitment to improving air quality and promoting sustainable practices. His work continues to inspire advancements in environmental technology and demonstrates the impact of dedicated inventors in addressing critical global challenges.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
