David N Cockayne

Title: David N Cockayne: Innovator in Gold Plating Technology

Introduction

David N Cockayne is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of electrochemistry, particularly in gold plating technology. His innovative approach has led to the development of a unique gold plating bath that is particularly beneficial for the semiconductor industry.

Latest Patents

David N Cockayne holds a patent for a "Gold plating bath containing tartrate and carbonate salts." This patent describes a bath for electrodepositing gold that utilizes salts providing the tartrate radical and the carbonate radical as essential ingredients of its electrolyte. The bath operates with a pH value ranging from approximately neutral to highly alkaline, with adjustments to lower the pH being made using tartaric acid. This innovative bath is capable of producing highly pure deposits and desirable alloy deposits, making it especially well-suited for applications in the semiconductor industry. He has 1 patent to his name.

Career Highlights

David is associated with the American Chemical & Refining Company Inc., where he has been able to apply his expertise in electrochemistry. His work has contributed to advancements in gold plating technology, which is crucial for various industrial applications.

Collaborations

Throughout his career, David has collaborated with notable colleagues such as Augustus Fletcher and William L Moriarty. These collaborations have further enriched his work and contributed to the development of innovative solutions in the field.

Conclusion

David N Cockayne is a distinguished inventor whose work in gold plating technology has made a significant impact, particularly in the semiconductor industry. His innovative patent and collaborations highlight his contributions to the field of electrochemistry.