Redmond, WA, United States of America

David Marion Hattaway

This inventor holds 1 USPTO granted patent. Top assignee: Microsoft Technology Licensing, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Marion Hattaway. Retrieved from https://idiyas.com/inventor/david-marion-hattaway

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: David Marion Hattaway: Inventor of Cross-Platform Mutual Exclusion.

Introduction

David Marion Hattaway is an inventor based in Redmond, Washington. His work includes a patent for generating platform-specific code from platform-agnostic source code to implement mutual exclusion efficiently.

Latest Patents

Hattaway is associated with 1 patent: “Cross-platform mutual exclusion.” The patent describes systems, methods, apparatuses, and computer program products that determine an efficient mutual exclusion implementation for a target platform and generate platform-specific code accordingly. This approach is designed to ensure that instances of a code block execute in isolation from other instances within the relevant context.

Career Highlights

Hattaway is associated with Microsoft Technology Licensing, LLC. His patented work addresses a software development challenge: implementing mutual exclusion across different computing platforms while allowing developers to work from platform-agnostic source code.

Collaborations

Hattaway’s listed coworker is Madhav Himanshubhai Pandya. Their association provides a connection between Hattaway’s patent work and other professionals in the technology field.

Conclusion

David Marion Hattaway’s patent focuses on translating platform-agnostic code into platform-specific implementations that support efficient mutual exclusion, reflecting an effort to make software behavior more adaptable across platforms.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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