This inventor holds 1 USPTO granted patent. Top assignee: Fuel Tech, Inc.. Active years: 2022.
Company Filing History:
Years Active: 2022
Title: David M Kieffer: Innovator in Ammonia Generation Technology
Introduction
David M Kieffer is an accomplished inventor based in North Aurora, IL (US). He has made significant contributions to the field of ammonia generation technology. His innovative approach focuses on creating a controlled, compact, on-demand ammonia gas generation process and apparatus.
Latest Patents
Kieffer holds a patent for a "Controlled, compact, on-demand ammonia gas generation process and apparatus." This patent discloses methods and compact apparatus for generating ammonia from urea. The process involves gasifying an aqueous urea solution in a chamber using hot gas. It controls the flows of the aqueous urea solution and hot gas to achieve complete gasification, resulting in a gas mixture that includes ammonia, isocyanic acid, carbon dioxide, and water vapor. The gas mixture is then passed through a catalyst bed containing particulate transition metal oxide, which converts isocyanic acid to ammonia. The apparatus designed for this process includes flow managing equipment and catalyst supports that facilitate continuous operation with precise control.
Career Highlights
Kieffer's career is marked by his work at Fuel Tech, Inc., where he has been instrumental in developing innovative technologies. His expertise in ammonia generation has positioned him as a key figure in the industry.
Collaborations
Throughout his career, Kieffer has collaborated with notable colleagues, including William H Sun and Ronald A Lau. These collaborations have contributed to the advancement of ammonia generation technologies and have fostered a spirit of innovation within the field.
Conclusion
David M Kieffer's contributions to ammonia generation technology exemplify his commitment to innovation and excellence. His patent and work at Fuel Tech, Inc. highlight his role as a leading inventor in this important area of research.